UPW Micro 2015 Gathers Ultrapure Water Experts in Portland, Ore.

Nov. 2, 2015
UPW Micro 2015 collected key professionals on the water side of semiconductor manufacturing in one place to discuss technological breakthroughs and upcoming needs, cost saving and reuse opportunities, and developments in the sector. For the first time, the 18th-annual conference added on wastewater treatment and facility water management in a second strand to semiconductor-grade, high-purity water production sessions. Benjamin Eynon, senior director of engineering development at Samsung Austin Semiconductor, was the keynote speaker at the opening session Tuesday, Oct. 27 in Portland, Ore. With a career ranging from engineering to executive management roles within the semiconductor lithography, photomask, and equipment supply, Eynon has worked in the semiconductor industry for 28 years. He holds multiple patents in photomask and wafer lithography and has written many technical papers and articles. In 2005, he published the photomask industry’s reference book titled, “Photomask Fabrication Technology.” Co-moderators of the Microelectronics Water Management Track were Allen Boyce of BW Design Group, Loredana Pullano of IBM Research, and Alan Knapp of Evoqua Water Technologies. The Semiconductor UPW Track was co-moderated by Bernie Zerfas of GLOBALFOUNDRIES, Dan Wilcox of Samsung Austin Semiconductor, and Dr. Slava Libman of Balazs Air Liquide. In addition to the technical program, UPW Micro 2015 offered delegates networking opportunities, including a round table networking session and exhibits by companies that are key suppliers of water treatment products and services to the microelectronics industry. Through the two technical sessions, round tables and exhibits, attendees had numerous opportunities to speak with decision-makers from end user companies, suppliers, engineering firms and consulting agencies.

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