For several decades, lobe and multistage blowers were the tried-and-true blower technologies for wastewater treatment plants. Over the past 15...
Consortium to develop the next generation of wafer fabs
GLV Inc. (GLV Group) has announced that its business sector Ovivo was recently recognized as the only water treatment company to be part of the Facility 450 Consortium (F450C)—a select group of companies that will collaborate to develop the next generation of wafer fabs. "It is a demonstration of trust from the semiconductor industry, and especially a recognition of Ovivo’s technological skills in the ultrapure and water recycling technologies," said Richard Verreault, president and chief executive officer of GLV Inc.
Following the formal announcement from New York Governor Andrew Cuomo of the formation of the F450C, ten leading nanoelectronics facility companies from around the world will collaborate at the State University of New York’s College of Nanoscale Science and Engineering (CNSE) to lead a global effort to design and build the next-generation 450-mm computer chip fabrication facilities. At the semiconductor industry’s annual SEMICON West tradeshow—which took place in San Francisco, California, from July 9 to 11—the F450C hosted its first public panel discussion about facility and infrastructure solutions for the transition to 450-mm wafer fabrication.
Beyond the manufacturing hurdles that 450-mm wafer processing brings, next-generation wafer fabs present new challenges with respect to facility design, substrate handling, tool connection, chemical distribution, water and electrical systems and many other areas. Where the Global 450 Consortium (G450C) provides leadership in the area of 450-mm equipment and process technologies, the F450C is designed to develop facility and infrastructure solutions that are essential to the transition to 450-mm wafer fabrication. Ovivo is the only water treatment company that was selected by the F450C, thanks to its ultrapure water, water recycling and wastewater treatment know-how and track record.