Benjamin Eynon, senior director of engineering development at Samsung Austin Semiconductor, will be the keynote speaker at Ultrapure Water (UPW) Micro 2015’s opening session Tuesday, Oct. 27 in Portland, Ore.
With a career ranging from engineering to executive management roles within the semiconductor lithography, photomask, and equipment supply, Eynon has worked in the semiconductor industry for 28 years. He holds multiple patents in photomask and wafer lithography and has written many technical papers and articles. In 2005, he published the photomask industry’s reference book titled, “Photomask Fabrication Technology.”
The 18th annual UPW Micro conference will have presentations focused on high-purity water produced by semiconductor facility utility plants, as well as water at the point-of-use. Additionally, for the first time, the conference is expanding to include a second track on wastewater and process water.
Co-moderators of the Microelectronics Water Management Track will be Allen Boyce of BW Design Group, Loredana Pullano of IBM Research, and Alan Knapp of Evoqua Water Technologies. The Semiconductor UPW Track will be co-moderated by Bernie Zerfas of GLOBALFOUNDRIES, Dan Wilcox of Samsung Austin Semiconductor, and Dr. Slava Libman of Balazs Air Liquide.
In addition to the technical program, UPW Micro 2015 will offer delegates networking opportunities, including a round table networking session and exhibits by companies that are key suppliers of water treatment products and services to the microelectronics industry. Through the two technical sessions, round tables and exhibits, attendees will have numerous opportunities to speak with decision makers from enduser companies, suppliers, engineering firms, and consulting agencies.
Source: Ultrapure Water Micro
